The DC filament-driven ion sources are an extension to the highly successful family of atom sources from Oxford Applied Research. They have been extensively developed with simple operation and
servicing in mind. The flange mount sources are UHV compatible and primarily for use with argon. They
are highly suited for applications such as ion-beam assisted deposition (IBAD), sputter deposition, etching, and substrate cleaning.
A high-transparency grid-set is used to extract ions from the plasma, resulting in a high beam current density and excellent beam profiles. The DC25s ion source has been developed in response to increased demand for high ion currents at very low energies (< 20eV).
|Standard in-vacuum length||100mm||100mm||230mm|
|Mounting flange *||NW63CF||NW63CF||NW200CF|
|Ion beam energy||100eV-1keV||10eV-200keV||100eV-1keV|
|Beam current||40mA (max)**||5mA (max)||300mA (max)|
|Operating gas flow||3-10 sccm||3-10 sccm||15-20 sccm|
|Grid material||Inconel, Mo***||Inconel, Mo***||Inconel, Mo***|
|* For externally mounted source. Internally mounted sources are also available|
|** Gas dependent|
|*** Parallel, concave, convex grid-set options|